Overview
FE-LEEM/PEEM P90 NAP is the only commercial PEEM/LEEM system which can be work in near ambient pressure. Near ambient pressure electron lens and differential pumping system, which fostered in NAP-XPS is applied to FE-LEEM/PEEM P90 NAP. Thus, near ambient pressure microscopy measurement for the sample top layer will be available.
Feature
- Working pressures from UHV up to Near Ambient Pressure conditions up to 1 mbar
- Sample temperatures up to 1000℃
- Lateral resolution <30 nm
- Integrated imaging energy filter
- Cold field emission gun for LEEM
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