Measure plasma emission from 200 to 1100 nm in only 3 milliseconds.
Plasma Monitoring and Control system, PlasCalc-2000-UV/VUS/NIR

MP01 Quotation・Inquiry
  • Outline
  • Related Documents
The PlasCalc Plasma Monitoring System measures plasma emission from 200-1100 nm in only 3 milliseconds. The PlasCalc benefits from advanced process control systems and sophisticated algorithms for data acquisition. PlasCalc comes with operating software. The Integrated Formula Editor provides easy access to a full range of mathematical and algorithmic functions. An optional Emission Wavelength Library, available for a separate price, provides species identification, while the Wavelength Editor allows you to optimize signal-to-noise. A dual-window interface shows the actual spectrum and all process control information. The Recipe Editor tool allows you to easily and rapidly configure, build and save experiment methods. It is easy to build robust recipes for the most difficult plasma processes such as measuring film deposition, monitoring plasma etching, examining surface cleaning, analyzing plasma chamber health control and monitoring abnormal pollution or discharge phenomena.

Adobe Reader is required to view the downloaded PDF files.
Please download it from the left banner and install it.

Last Updated Update Information Size Download

Frequently Asked Questions


* Please give us an Inquiry No.MP01

Telephone *Please give us an Inquiry No.
Head Office 81-3-3686-4711
Osaka Office 81-6-6393-7411